发明名称 |
USE OF COMPOSITIONS COMPRISING A SURFACTANT AND A HYDROPHOBIZER FOR AVOIDING ANTI PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW |
摘要 |
In a method of treating a substrate including patterns having line-space dimensions of 50 nm or below, the substrate is rinsed by an aqueous composition including at least one non-ionic surfactant A and at least one hydrophobizer B. The at least one surfactant A has an equilibrium surface tension of 10 mN/m to 35 mN/m, determined from a solution of the at least one surfactant A in water at the critical micelle concentration. The hydrophobizer B is selected so that the contact angle of water to the substrate is increased by contacting the substrate with a solution of the hydrophobizer B in water by 5-95° compared to the contact angle of water to the substrate before such contacting. |
申请公布号 |
KR20150096470(A) |
申请公布日期 |
2015.08.24 |
申请号 |
KR20157018741 |
申请日期 |
2013.12.04 |
申请人 |
BASF SE |
发明人 |
KLIPP ANDREAS;HONCIUC ANDREI;OETTER GUENTER;BITTNER CHRISTIAN |
分类号 |
H01L21/027;C11D1/835;C11D1/94;C11D11/00;H01L21/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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