| 发明名称 |
PLASMA SOURCE FOR A PLASMA CVD APPARATUS AND A MANUFACTURING METHOD OF AN ARTICLE USING THE PLASMA SOURCE |
| 摘要 |
A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase. |
| 申请公布号 |
US2015235814(A1) |
申请公布日期 |
2015.08.20 |
| 申请号 |
US201514699249 |
申请日期 |
2015.04.29 |
| 申请人 |
Asahi Glass Company, Limited |
发明人 |
Kawahara Hirotomo;Aomine Nobutaka;Maeshige Kazunobu;Aoshima Yuki;Hanekawa Hiroshi |
| 分类号 |
H01J37/32;C23C16/50 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma source for a plasma CVD apparatus, comprising:
an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode that are arranged in a row in that order, wherein: said electrode group is connected to at least one AC power supply; a voltage supplied to two of said four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes; spaces to which a source gas is supplied are provided between the adjacent electrodes; and voltages applied to at least one set among the adjacent two electrodes are in the same phase. |
| 地址 |
Tokyo JP |
