POLYMERIZABLE COMPOSITION FOR STEREOLITHOGRAPHY

摘要

Provided is a highly versatile polymerizable composition that allows the fabrication equipment to be washed easily with water, allows the fabricated object to be removed easily from the support, and allows easy curing by application of light rays of 400 nm or higher, in optical 3D fabrication by lamination fabrication. A photopolymerizable composition for stereolithography containing a water-soluble radical polymerizable compound (A) represented by formula (1), a photopolymerization initiator (B) that generates radicals upon application of light rays of a wavelength of 400 nm or higher, and an ionic surfactant (C). In formula (1), R1 is an organic group of valence a, a is an integer of 2 or higher, and R2 is hydrogen or an alkyl having 1-6 carbon atoms.;

主权项

1. A photopolymerizable composition for stereolithography, containing water-soluble radically polymerizable compound (A) represented by formula (1), photopolymerization initiator (B) that generates radicals by irradiation with light rays having a wavelength of 400 nanometers or more, and ionic surfactant (C):wherein, in formula (1), R1 is an a-valent organic group, a is an integer of 2 or more, and R2 is hydrogen or alkyl having 1 to 6 carbons.