发明名称 |
SILOXANE POLYMER COMPOSITIONS AND METHODS OF USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a siloxane polymer composition having properties suitable for use in negative tone lithographic fabrication processes.SOLUTION: A siloxane polymer composition comprises: a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution and exhibiting reactive functional groups which are capable of reacting during a thermal or radiation initiated curing process; a photoreactive compound; and a solvent. The composition can be used in negative tone lithographic fabrication processes where a water based developer system is applied in a development process of a lithography production method. |
申请公布号 |
JP2015147930(A) |
申请公布日期 |
2015.08.20 |
申请号 |
JP20150047428 |
申请日期 |
2015.03.10 |
申请人 |
OPTITUNE OY |
发明人 |
ARI KARKKAINEN;MILJA HANNU-KUURE;SACHA LEGRAND;AMIR HADZIC;GRAEME GORDON |
分类号 |
C08G59/20;C08G77/04 |
主分类号 |
C08G59/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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