发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 A semiconductor device has a semiconductor substrate having a first surface and a second surface, a through electrode penetrating through the semiconductor substrate and having a protrusion protruding from the second surface, and an insulation layer on the second surface, which covers the side surface of the protrusion, has an opening through which to expose the end surface of the protrusion, and has a thickness greater than the length of the protrusion.
申请公布号 US2015235901(A1) 申请公布日期 2015.08.20
申请号 US201514703478 申请日期 2015.05.04
申请人 FUJITSU SEMICONDUCTOR LIMITED 发明人 Ohira Hikaru;Owada Tamotsu;Ochimizu Hirosato
分类号 H01L21/768;H01L21/321;H01L21/311;H01L21/3105 主分类号 H01L21/768
代理机构 代理人
主权项
地址 Yokohama-shi JP