| 发明名称 |
Method of manufacturing patterned substrate for culturing cells, patterned substrate for culturing cells, patterning method of culturing cells, and patterned cell chip |
| 摘要 |
The present invention relates to a method of manufacturing a patterned substrate for culturing cells, comprising the steps of: (1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma. |
| 申请公布号 |
US2015232806(A1) |
申请公布日期 |
2015.08.20 |
| 申请号 |
US201514634190 |
申请日期 |
2015.02.27 |
| 申请人 |
Sungkyunkwan University Foundation for Corporate Collaboration |
发明人 |
Jung Dong Geun;Choi Chang Rok;Kim Kyung Seop |
| 分类号 |
C12N5/00;B05D1/32;B05D1/00 |
主分类号 |
C12N5/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a patterned substrate for culturing cells, comprising the steps of:
(1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma. |
| 地址 |
Gyeonggi-do KR |
