| 摘要 |
<p>An apparatus and a method for applying particles within a pre-determined limited area of an absorbent structure. The apparatus has: a nozzle arranged to dispense the particles on the pre-determined limited area of the absorbent structure; conduit for supplying particles by a gas flow from a particle container to the nozzle; a valve arranged between the nozzle and the particle container; and, a valve vane arranged to direct the gas flow having particles through the valve from a particle inlet to an application outlet when the valve is in a first position and to direct the gas flow having particles through the valve from the particle inlet to a residue outlet when the valve is in a second position. The apparatus also has a device for maintaining a gas flow in the application outlet when the valve is in the second position.</p> |
