发明名称 Semiconductor device
摘要 According to one embodiment, a semiconductor device includes: a first region including: a first semiconductor layer; a first semiconductor region; a second semiconductor region; a third semiconductor region having higher impurity concentration than the first semiconductor region; a first electrode; a second electrode; an insulating film; a third electrode; a fourth electrode, a second region including a pad electrode, and the third region including: the first semiconductor layer; the first semiconductor region; a third semiconductor region; the first electrode; the second electrode; and a first insulating layer.
申请公布号 US9111771(B2) 申请公布日期 2015.08.18
申请号 US201414492634 申请日期 2014.09.22
申请人 Kabushiki Kaisha Toshiba 发明人 Matsuoka Takeru;Saito Yasuhito;Kamiyama Seiichiro
分类号 H01L29/76;H01L29/94;H01L29/06;H01L29/78;H01L29/40 主分类号 H01L29/76
代理机构 White & Case LLP 代理人 White & Case LLP
主权项 1. A semiconductor device comprising: a first region; and a second region being adjacent to the first region, the first region including: a first semiconductor layer of a first conductivity type;a first semiconductor region of a second conductivity type provided on the first semiconductor layer;a second semiconductor region of the first conductivity type provided on the first semiconductor region;a first electrode electrically connected to the second semiconductor region;a second electrode electrically connected to the first semiconductor layer;a third electrode facing the first semiconductor layer, the first semiconductor region, and the second semiconductor region via an insulating film; anda fourth electrode facing the first semiconductor layer and the third electrode via the insulating film, the second region including: the first semiconductor layer of a first conductivity type;the first semiconductor region of a second conductivity type provided on the first semiconductor layer;the fourth electrode facing the first semiconductor layer and the first semiconductor region via the insulating film; anda pad electrode provided on the first semiconductor layer, and electrically connected to the third electrode.
地址 Tokyo JP