发明名称 |
Semiconductor device |
摘要 |
According to one embodiment, a semiconductor device includes: a first region including: a first semiconductor layer; a first semiconductor region; a second semiconductor region; a third semiconductor region having higher impurity concentration than the first semiconductor region; a first electrode; a second electrode; an insulating film; a third electrode; a fourth electrode, a second region including a pad electrode, and the third region including: the first semiconductor layer; the first semiconductor region; a third semiconductor region; the first electrode; the second electrode; and a first insulating layer. |
申请公布号 |
US9111771(B2) |
申请公布日期 |
2015.08.18 |
申请号 |
US201414492634 |
申请日期 |
2014.09.22 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Matsuoka Takeru;Saito Yasuhito;Kamiyama Seiichiro |
分类号 |
H01L29/76;H01L29/94;H01L29/06;H01L29/78;H01L29/40 |
主分类号 |
H01L29/76 |
代理机构 |
White & Case LLP |
代理人 |
White & Case LLP |
主权项 |
1. A semiconductor device comprising:
a first region; and a second region being adjacent to the first region, the first region including:
a first semiconductor layer of a first conductivity type;a first semiconductor region of a second conductivity type provided on the first semiconductor layer;a second semiconductor region of the first conductivity type provided on the first semiconductor region;a first electrode electrically connected to the second semiconductor region;a second electrode electrically connected to the first semiconductor layer;a third electrode facing the first semiconductor layer, the first semiconductor region, and the second semiconductor region via an insulating film; anda fourth electrode facing the first semiconductor layer and the third electrode via the insulating film, the second region including:
the first semiconductor layer of a first conductivity type;the first semiconductor region of a second conductivity type provided on the first semiconductor layer;the fourth electrode facing the first semiconductor layer and the first semiconductor region via the insulating film; anda pad electrode provided on the first semiconductor layer, and electrically connected to the third electrode. |
地址 |
Tokyo JP |