发明名称 Memory cells and methods of storing information
摘要 Memory cells which have channel-supporting material, dielectric material over the channel-supporting material, carrier-trapping material over the dielectric material and an electrically conductive electrode material over and directly against the carrier-trapping material. The carrier-trapping material includes gallium, indium, zinc and oxygen. Methods of storing utilizing a memory cell which has a channel-supporting material, a dielectric material over the channel-supporting material, a carrier-trapping material over the dielectric material, and an electrically conductive electrode material over and directly against the carrier-trapping material. The carrier-trapping material includes gallium, indium, zinc and oxygen. It is determined if carriers are trapped in the carrier-trapping material to thereby ascertain a memory state of the memory cell.
申请公布号 US9112046(B2) 申请公布日期 2015.08.18
申请号 US201313944235 申请日期 2013.07.17
申请人 Micron Technology, Inc. 发明人 Sandhu Gurtej S.;Ramaswamy D. V. Nirmal
分类号 G11C16/04;H01L29/792;H01L21/28;G11C16/34 主分类号 G11C16/04
代理机构 Wells St. John P.S. 代理人 Wells St. John P.S.
主权项 1. A memory cell comprising: a channel between a pair of source/drain regions; and a carrier-trapping material spaced from the channel by a dielectric material; with the carrier-trapping material comprising gallium oxide, indium oxide, and zinc oxide.
地址 Boise ID US
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