| 发明名称 |
METHOD OF PROCESSING A SUBSTRATE |
| 摘要 |
<p>Provided is a method for processing a substrate by a physical vapor deposition (PVD) by applying cooling gases on the substrate to lift the substrate from a substrate support unit for a PVD process.</p> |
| 申请公布号 |
KR20150093622(A) |
申请公布日期 |
2015.08.18 |
| 申请号 |
KR20150019203 |
申请日期 |
2015.02.09 |
| 申请人 |
SPTS TECHNOLOGIES LIMITED |
发明人 |
ANTHONY PAUL WILBY;STEPHEN R BURGESS |
| 分类号 |
H01L21/203 |
主分类号 |
H01L21/203 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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