发明名称 Silica membrane and method for manufacturing the same
摘要 There is provided a silica membrane 1 formed on a porous substrate. A desorbed ionic strength of water having a temperature of 500° C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g. The silica membrane 1 is manufactured by allowing a silica sol having a water concentration of 0.03 to 3 mass % to adhere to a porous substrate by an ethanol solvent, drying the silica sol by sending air having a dew point of −70 to 0° C., and firing the dried silica sol at 200 to 400° C.
申请公布号 US9108166(B2) 申请公布日期 2015.08.18
申请号 US201113182589 申请日期 2011.07.14
申请人 NGK Insulators, Ltd. 发明人 Takahashi Naoko;Asai Kouta
分类号 B01D71/02;B01D53/22;B01D61/36;B01D63/06;B01D69/02;B01D67/00 主分类号 B01D71/02
代理机构 Burr & Brown, PLLC 代理人 Burr & Brown, PLLC
主权项 1. A silica membrane formed on a porous substrate, wherein a desorbed ionic strength of water having a temperature of 500° C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g or more, and wherein the silica membrane is manufactured by a method comprising: allowing a silica sol having a water concentration of 0.03 to 3 mass % with an ethanol solvent to adhere to a porous substrate, drying the silica sol by blowing air having a dew point of −70 to 0° C., and firing the dried silica sol at 200 to 400° C.
地址 Nagoya JP
您可能感兴趣的专利