发明名称 |
Silica membrane and method for manufacturing the same |
摘要 |
There is provided a silica membrane 1 formed on a porous substrate. A desorbed ionic strength of water having a temperature of 500° C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g. The silica membrane 1 is manufactured by allowing a silica sol having a water concentration of 0.03 to 3 mass % to adhere to a porous substrate by an ethanol solvent, drying the silica sol by sending air having a dew point of −70 to 0° C., and firing the dried silica sol at 200 to 400° C. |
申请公布号 |
US9108166(B2) |
申请公布日期 |
2015.08.18 |
申请号 |
US201113182589 |
申请日期 |
2011.07.14 |
申请人 |
NGK Insulators, Ltd. |
发明人 |
Takahashi Naoko;Asai Kouta |
分类号 |
B01D71/02;B01D53/22;B01D61/36;B01D63/06;B01D69/02;B01D67/00 |
主分类号 |
B01D71/02 |
代理机构 |
Burr & Brown, PLLC |
代理人 |
Burr & Brown, PLLC |
主权项 |
1. A silica membrane formed on a porous substrate, wherein a desorbed ionic strength of water having a temperature of 500° C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g or more, and wherein the silica membrane is manufactured by a method comprising:
allowing a silica sol having a water concentration of 0.03 to 3 mass % with an ethanol solvent to adhere to a porous substrate, drying the silica sol by blowing air having a dew point of −70 to 0° C., and firing the dried silica sol at 200 to 400° C. |
地址 |
Nagoya JP |