发明名称 Sensor stack venting
摘要 Sensor stack venting techniques are described. In one or more implementations, one or more vent structures are formed within layers of a pressure sensitive sensor stack for a device. Vent structures including channels, holes, slots, and so forth are designed to provide pathways for gas released by feature elements to escape. The pathways may be arranged to convey outgases through the layers to designated escape points in a controlled manner that prevents deformities typically caused by trapped gases. The escape points in some layers enable at least some other layers to be edge-sealed. Pathways may then be formed to convey gas from the edge-sealed layer(s) to an edge vented layer(s) having one or more escape points, such that feature elements in the edge-sealed layer(s) remain protected from contaminants.
申请公布号 US9111703(B2) 申请公布日期 2015.08.18
申请号 US201213653184 申请日期 2012.10.16
申请人 Microsoft Technology Licensing, LLC 发明人 Whitt, III David Otto;Shaw Timothy C.;Vandervoort David C.;Pleake Todd David;Huala Rob;Mickelson Matthew David;Pelley Joel Lawrence;Stoumbos Christopher Harry;Spooner Richard Peter
分类号 H01H13/82;H01H13/88;G06F3/02;G09F13/04;H01H13/704;G06F1/16 主分类号 H01H13/82
代理机构 代理人 Roper Brandon;Yee Judy;Minhas Micky
主权项 1. An apparatus comprising: a pressure sensitive sensor stack having a plurality of layers that include one or more feature elements to implement accessory functionality provided by the apparatus; one or more vent structures formed in the pressure sensitive sensor stack to convey gases released by the feature elements between the plurality of layers to designated escape points disposed in one or more of the plurality of layers; and a designated vent layer configured to include the designated escape points to handle the gases that are conveyed to the designated vent layer via the vent structures from at least one other layer of the plurality of layers.
地址 Redmond WA US