Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this type

摘要

A metrology system serves to examine an object arranged in an object field using EUV illumination light. An illumination optics of the metrology system has a collector mirror which is arranged in the beam path directly downstream of an EUV light source. Downstream of the collector mirror, less than three additional illumination mirrors are arranged in the beam path between the collector mirror and the object field. An intermediate focus is arranged in the beam path between the collector mirror and the additional illumination mirror. The metrology system further includes a magnifying imaging optics for imaging the object field into an image field in an image plane. As a result a metrology system is obtained which comprises an illumination optics that ensures an efficient illumination of the object field by means of illumination parameters which are well adapted to the illumination situation of current EUV projection exposure apparatuses.

主权项

1. Illumination optics for a metrology system for examining an object arranged in an object field using EUV illumination light, the illumination optics comprising:
a beam path between an EUV light source and the object field; a collector mirror which is arrangeable in the beam path directly downstream of the EUV light source; and less than three additional illumination mirrors arranged in the beam path between the collector mirror and the object field, with an intermediate focal plane being arranged in the beam path between the collector mirror and the first additional illumination mirror.