Substrate processing apparatus and method of operating the same

摘要

Provided is a substrate processing apparatus including a first conduit configured to supply a processing solution to a substrate loaded on a supporter, and a second conduit in fluid communication with the first conduit, the second conduit configured to supply a gas to the first conduit to be mixed with the processing solution, wherein the first conduit includes an opening to permit the processing solution mixed with the gas to be injected onto the substrate.

主权项

1. A substrate processing apparatus, comprising:
a first conduit configured to supply a processing solution to a substrate loaded on a supporter, the first conduit having a first terminal and a second terminal; a second conduit in direct fluid communication with the first conduit between the first terminal and the second terminal, the second conduit configured to supply a gas to the first conduit to be mixed with the processing solution in a mixing portion of the first conduit, and a head unit including an internal space downstream of the mixing portion which is a space inside the first conduit, wherein the first conduit includes an opening to permit the processing solution mixed with the gas to be injected onto the substrate, and wherein the internal space surrounds the opening of the first conduit.