Process for the manufacture of polyacrylates having reduced content of residual monomer

摘要

Polyacrylates (I) with a reduced acrylate monomer fraction are claimed, which are treated with maleic anhydride and peroxide and subjected to secondary polymerisation after free radical solution copolymerisation of: (a) 0-50 wt.% hydroxyalkyl (meth)acrylate(s), (b) 30-90 wt.% methyl methacrylate (MMA), (c) 0-50 wt.% styrene, (d) 0-5 wt.% olefinically unsaturated carboxylic acid and (e) 0-50 wt.% other olefinically unsaturated monomer. Also claimed is a method for producing polyacrylate solutions, in which the residual acrylate monomer fraction after polymerisation is < 0.1 wt.%, by using monomers with low vapour pressure for secondary polymerisation.