发明名称 |
Method, system and device for recessed contact in memory array |
摘要 |
Embodiments disclosed herein may relate to forming a contact region for an interconnect between a selector transistor and a word-line electrode in a memory device. |
申请公布号 |
US9111857(B2) |
申请公布日期 |
2015.08.18 |
申请号 |
US201213624627 |
申请日期 |
2012.09.21 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
Pellizzer Fabio;Rigano Antonino;Mariani Marcello;Benvenuti Augusto |
分类号 |
G11C11/00;H01L27/24;H01L21/762;H01L45/00;G11C13/00;H01L21/308 |
主分类号 |
G11C11/00 |
代理机构 |
Knobbe, Martens, Olson & Bear LLP |
代理人 |
Knobbe, Martens, Olson & Bear LLP |
主权项 |
1. A memory device, comprising:
an array of memory cells each comprising a selector transistor, the array including a word-line contact region in a base component in substantially direct contact with an electrically conductive interconnect electrically coupled to a word-line electrode, the word-line contact region positioned between memory cells of the array, wherein the word-line contact region has a width between a pair of selector transistors of the array that is greater than two times a width of each of the selector transistors. |
地址 |
Boise ID US |