发明名称 Method, system and device for recessed contact in memory array
摘要 Embodiments disclosed herein may relate to forming a contact region for an interconnect between a selector transistor and a word-line electrode in a memory device.
申请公布号 US9111857(B2) 申请公布日期 2015.08.18
申请号 US201213624627 申请日期 2012.09.21
申请人 MICRON TECHNOLOGY, INC. 发明人 Pellizzer Fabio;Rigano Antonino;Mariani Marcello;Benvenuti Augusto
分类号 G11C11/00;H01L27/24;H01L21/762;H01L45/00;G11C13/00;H01L21/308 主分类号 G11C11/00
代理机构 Knobbe, Martens, Olson & Bear LLP 代理人 Knobbe, Martens, Olson & Bear LLP
主权项 1. A memory device, comprising: an array of memory cells each comprising a selector transistor, the array including a word-line contact region in a base component in substantially direct contact with an electrically conductive interconnect electrically coupled to a word-line electrode, the word-line contact region positioned between memory cells of the array, wherein the word-line contact region has a width between a pair of selector transistors of the array that is greater than two times a width of each of the selector transistors.
地址 Boise ID US