极紫外光源;EXTREME ULTRAVIOLET LIGHT SOURCE

摘要

一标靶材料系提供于一标靶位置，该标靶材料包括当转换成电浆时发射极紫外光的一材料，且该标靶材料沿着一第一方向延伸于一第一范围及沿着一第二方向延伸于一第二范围；一放大光束系经指引沿着一传播方向朝向该标靶位置；及该放大光束系聚焦于一聚焦平面，其中该标靶位置系在该聚焦平面外侧且该放大光束与该标靶材料之间之一交互作用将至少部份的该标靶材料转换成发射EUV光之电浆。; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.