METHOD FOR FORMING AMORPHOUS SILICON FILM, AND FILM FORMING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for forming an amorphous silicon film which has a flatter and smoother surface and enables the achievement of a thinner film.SOLUTION: A method for forming an amorphous silicon film comprises the steps of: causing the surface of the base 2 to adsorb the organic silicon compound having a bond of a silicon atom and a nitrogen atom by heating a base 2, and supplying the heated base 2 with gas including an organic silicon compound having a bond of a silicon atom and a nitrogen atom; forming an amorphous silicon film 4 on the base 2 with the organic silicon compound adsorbed thereon by heating the base 2, and supplying the heated base 2 with the organic silicon compound adsorbed thereon with a silane-based gas including no amino group; and reducing the amorphous silicon film 4 in film thickness by etching the amorphous silicon film 4.