| 发明名称 |
PIXILATED TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY |
| 摘要 |
Implementations described herein provide a pixilated substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a heating assembly. The pixilated substrate support assembly comprises an upper surface and a lower surface; one or more main resistive heaters disposed in the pixilated substrate support; and a plurality of pixel heaters in column with the main resistive heaters and disposed in the substrate support. A quantity of the pixel heaters is an order of magnitude greater than a quantity of the main resistive heaters and the pixel heaters are independently controllable relative to each other as well as the main resistive heater. |
| 申请公布号 |
US2015228513(A1) |
申请公布日期 |
2015.08.13 |
| 申请号 |
US201414285606 |
申请日期 |
2014.05.22 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
PARKHE Vijay D.;MAKHRATCHEV Konstantin;ONO Masanori;GUO Zhiqiang |
| 分类号 |
H01L21/67;H01L21/683 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A pixilated substrate support assembly, comprising:
a pixilated substrate support having an upper surface and a lower surface; one or more main resistive heaters disposed in the pixilated substrate support; and a plurality of pixel heaters in column with the main resistive heaters and disposed in the pixilated substrate support, wherein a quantity of the pixel heaters is an order of magnitude greater than a quantity of the main resistive heaters and the pixel heaters are independently controllable relative to each other as well as the main resistive heaters. |
| 地址 |
Santa Clara CA US |
