| 摘要 |
PROBLEM TO BE SOLVED: To provide: a sputtering target suitable for formation of a thin film excellent in transparency and gas barrier properties; a method for production thereof; a thin film using the target; and a thin film sheet and laminated sheet provided with the thin film.SOLUTION: The sputtering target comprises a sintered compact having zinc oxide (ZnO) and silicon dioxide (SiO) as main components. The relative density of the sintered compact is ≥95%, and a molar ratio of zinc oxide (ZnO) to silicon dioxide (SiO) is 40:60 to 95:5. |
