| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To achieve a method for manufacturing a water vapor barrier film with high durability and satisfactory water vapor barrier performance to obtain a water vapor barrier film with such the excellent performance, and electronic equipment using the water vapor barrier film and excellent in water vapor barrier properties. <P>SOLUTION: In the water vapor barrier film 10 formed by successively laminating a first water vapor barrier layer 4a, an intermediate layer 5, and a second water vapor barrier layer 4b on the substrate 1, the film thickness of the second water vapor barrier layer 4b to be the upper most surface side thereof is relatively made thinner and is formed into the thickness of 5% or more and 40% or less of the film thickness of the first water vapor barrier layer 4a. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
