| 发明名称 |
POLISHING COMPOSITION |
| 摘要 |
<p>A polishing composition of the present invention is to be used for polishing an object including a metal portion or an interlayer insulation film. The polishing composition contains silica on which an organic acid, such as a sulfonic acid and a carboxylic acid, is immobilized and an oxidizing agent.</p> |
| 申请公布号 |
EP2800124(A4) |
申请公布日期 |
2015.08.12 |
| 申请号 |
EP20120862165 |
申请日期 |
2012.12.25 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
YOKOTA, SHUUGO;KACHI, YOSHIHIRO;AKATSUKA, TOMOHIKO |
| 分类号 |
H01L21/304;B24B37/00;C09K3/14;H01L21/02;H01L31/05 |
主分类号 |
H01L21/304 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
