发明名称 |
Forming magnetic microelectromechanical inductive components |
摘要 |
A micro-electromechanical device and method of manufacture are disclosed. A sacrificial layer is formed on a silicon substrate. A metal layer is formed on a top surface of the sacrificial layer. Soft magnetic material is electrolessly deposited on the metal layer to manufacture the micro-electromechanical device. The sacrificial layer is removed to produce a metal beam separated from the silicon substrate by a space. |
申请公布号 |
US9105841(B2) |
申请公布日期 |
2015.08.11 |
申请号 |
US201313796496 |
申请日期 |
2013.03.12 |
申请人 |
International Business Machines Corporation |
发明人 |
Gallagher William J.;O'Sullivan Eugene J.;Wang Naigang |
分类号 |
H01L21/00;H01L43/14;B81B3/00;B81C1/00;H01F41/04;H01L49/02 |
主分类号 |
H01L21/00 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP ;Alexanian Vazken |
主权项 |
1. A method of manufacturing a micro-electromechanical device, comprising:
depositing a sacrificial layer on a wafer; forming a metal layer of the micro-electromechanical device on the sacrificial layer; removing the sacrificial layer to produce a suspended metal beam coupled to at least one support structure of the wafer; and electrolessly depositing a soft magnetic material on the metal layer to manufacture the micro-electromechanical device. |
地址 |
Armonk NY US |