Polymer, resist composition and patterning process

摘要

A photo or heat-sensitive polymer comprising recurring units having polymerizable anion-containing sulfonium salt and phenolic hydroxyl-containing recurring units is useful as a base resin to formulate a resist composition having high sensitivity, high resolution and low LWR.

主权项

1. A photo or heat-sensitive polymer comprising recurring units having the general formula (1A) or (1B) and recurring units having the general formula (2): wherein R1 is hydrogen, methyl or trifluoromethyl, R2, R3 and R4 are each independently a straight, branched or cyclic C1-C15 monovalent hydrocarbon group, L is a single bond or a straight, branched or cyclic C1-C20 divalent hydrocarbon group which may be substituted with or separated by a heteroatom, X is a C1-C5 divalent alkylene group in which some or all hydrogen atoms may be substituted by fluorine atoms, each of Z1 and Z2 forms a C5-C15 alicyclic group with the carbon atom to which it is attached, R5 is a halogen atom or C1-C10 alkyl group, L′ is a single bond or C1-C10 divalent organic group which may be substituted with an oxygen atom, m is an integer of 0 to 3, n is an integer of 1 or 2, N is an integer of 0 to 2, M+ is a sulfonium cation of the general formula (a) or iodonium cation of the general formula (b), wherein R101a, R101b, and R101c are each independently a substituted or unsubstituted, straight or branched C1-C10 alkyl, alkenyl or oxoalkyl group, or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group, or any two or more of R101a, R101b, and R101c may bond together to form a ring with the sulfur atom, R101d and R101e each are a C6-C20 aryl group which may contain a straight, branched or cyclic C1-C6 alkyl or alkoxy radical, or R101d and R101e may bond together to form a ring with the iodine atom.