发明名称 |
Method for manufacturing light-receiving device and light-receiving device |
摘要 |
A method for manufacturing a light-receiving device includes the steps of forming a stacked semiconductor layer including a non-doped light-receiving layer, the light-receiving layer having an n-type conductivity; forming a selective growth mask made of an insulating film on the stacked semiconductor layer, the selective growth mask having a pattern including a plurality of openings; selectively growing a selective growth layer doped with a p-type impurity on each portion of the stacked semiconductor layer by using the selective growth mask; and forming a p-n junction in each of plural regions of the light-receiving layer by diffusing the p-type impurity doped in each selective growth layer into the light-receiving layer during growing the selective growth layers. Each of the regions including one of the p-n junctions corresponds to one of the selective growth layers. The p-n junction in one of the regions is formed separately from the p-n junctions in the other regions. |
申请公布号 |
US9105804(B2) |
申请公布日期 |
2015.08.11 |
申请号 |
US201314136204 |
申请日期 |
2013.12.20 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
Iguchi Yasuhiro |
分类号 |
H01L27/14;H01L31/18;H01L31/0304 |
主分类号 |
H01L27/14 |
代理机构 |
Smith, Gambrell & Russell LLP |
代理人 |
Smith, Gambrell & Russell LLP |
主权项 |
1. A method for manufacturing a light-receiving device, the method comprising the steps of:
forming a stacked semiconductor layer including a non-doped light-receiving layer on a substrate, the light-receiving layer having an n-type conductivity; forming a selective growth mask made of an insulating film on the stacked semiconductor layer, the selective growth mask having a pattern including a plurality of openings; selectively growing a selective growth layer doped with a p-type impurity on each portion of the stacked semiconductor layer that is exposed through each of the openings by using the selective growth mask; and forming a plurality of p-n junctions in the light-receiving layer by diffusing the p-type impurity doped in each selective growth layer into the light-receiving layer, wherein each p-n junction is formed during the step of selectively growing a selective growth layer, each of the p-n junctions corresponds to one of the selective growth layers, and at least one p-n junction in the light-receiving layer is formed separately from other p-n junctions in the light-receiving layer. |
地址 |
Osaka JP |