发明名称 Deposition mask and mask assembly having the same
摘要 A deposition mask assembly having a plurality of deposition masks consecutively arranged in parallel is discussed. The deposition mask has a frame coupled with the plurality of deposition masks, wherein cross section of one end of each deposition mask having first and second sectors which are asymmetric and meet each other at a first contact point, wherein the first sector has a first radius and a first center angle, and connected to an upper surface of the deposition mask, the second sector has a second radius different from the first radius and a second center angle different from the first center angle, and connected to a lower surface of the deposition mask, and the contact point is asymmetric, pointed and protruded horn-shaped or arrow-shaped.
申请公布号 US9105849(B2) 申请公布日期 2015.08.11
申请号 US201414295983 申请日期 2014.06.04
申请人 LG DISPLAY CO., LTD. 发明人 Park Chong-Hyun;Kim Tae-Hyung;Lee Il-Hyun
分类号 B05C11/00;H01L51/00;B05C21/00;C23C14/04 主分类号 B05C11/00
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A mask assembly comprising: a plurality of deposition masks consecutively arranged in parallel; and a frame coupled with the plurality of deposition masks, wherein the plurality of deposition masks include a first deposition mask and a second deposition mask being adjacent to the first deposition mask, one end of the first deposition mask and one end of the second deposition mask facing the one end of the first deposition mask are formed in an asymmetric, pointed and protruded shaped cross section, the cross section of the one end of the first deposition mask includes first and second sectors being different from each other and meeting at a first contact point, and the cross section of the one end of the second deposition mask includes third and fourth sectors being different from each other, being different from the first and second sectors, and meeting at a second contact point which does not face the first contact point.
地址 Seoul KR
您可能感兴趣的专利