CHEMICAL VAPOR INFILTERATION EQUIPMENT WITH MULTI-REACTOR

摘要

The present invention relates to a chemical vapor infiltration equipment with multi-reactor, comprises a plurality of chemical vapor deposition reactors on single power which electrically connected in series between the reactors. and a processing gas main pipe is connected in series between the reactors. Thus, the present invention has an effect on enabling control to an output from small quantities to large quantities by controlling a number of reactors based on the output.