发明名称 |
SUPPORT POUR WAFER AVEC DISPOSITIONS POUR AMELIORER L'UNIFORMITE DE CHAUFFE DANS DES SYSTEMES DE DEPOT CHIMIQUE EN PHASE VAPEUR |
摘要 |
<p>A wafer carrier and methods of making the same for use in a system for growing epitaxial layers on one or more wafers by chemical vapor deposition. The wafer carrier includes wafer retention pockets recessed in its body. A thermally-insulating spacer is situated at least partially in the at least one wafer retention pocket and arranged to maintain a spacing between the peripheral wall surface and the wafer, the spacer being constructed from a material having a thermal conductivity less than a thermal conductivity of the wafer carrier such that the spacer limits heat conduction from portions of the wafer carrier body to the wafer. The wafer carrier further includes a spacer retention feature that engages with the spacer and includes a surface oriented to prevent centrifugal movement of the spacer when subjected to rotation about the central axis.</p> |
申请公布号 |
FR3003399(B3) |
申请公布日期 |
2015.08.07 |
申请号 |
FR20140052158 |
申请日期 |
2014.03.14 |
申请人 |
VEECO INSTRUMENTS, INC. |
发明人 |
KRISHNAN SANDEEP;URBAN LUKAS;QUINN WILLIAM E.;MONTGOMERY JEFFERY S.;MANGNUM JOSHUA |
分类号 |
H01L21/683;C23C16/458;H01L21/205 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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