发明名称 SUBSTRATE LIQUID PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus in which a plurality of process liquids can be drained to a prescribed drainage passage. ! SOLUTION: A substrate processing apparatus 16 supplies a substrate W held by a substrate holding part 31 with a processing liquid selected from a plurality of processing liquids in a processing liquid supply unit. Inner cups 50a, 50b constructed to be movable up and down surround the substrate holding part 31 from a lateral side, and form a first drainage passage which guides a first processing liquid supplied to the substrate W downward so as to drain. An outer cup 50c surrounds the inner cups 50a, 50b, and forms a second drainage passage which guides a second processing liquid supplied to the substrate W downward so as to drain. A cover part 54 covers the outer cup 50c from outside, includes an eaves part 541 extending from an upper side of a cylindrical part 543 to inside, and forms an exhaust passage between the outer cup 50c and the cover p
申请公布号 JP2015144239(A) 申请公布日期 2015.08.06
申请号 JP20140211908 申请日期 2014.10.16
申请人 TOKYO ELECTRON LTD 发明人 WAKIYAMA TERUFUMI ; ITO NORIHIRO ; TOJIMA JIRO
分类号 H01L21/304 主分类号 H01L21/304
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