PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

The present invention relates to a pattern forming method which comprises: a step for forming a film using an active light sensitive or radiation sensitive resin composition that contains (A) a resin which is increased in the polarity by the action of an acid, thereby being decreased in the solubility in a developer liquid that contains an organic solvent, (B) a compound that generates an acid by being irradiated with specific active light or radiation, and (C) a solvent; a step for exposing the film to light; and a step for developing the light-exposed film using a developer liquid that contains an organic solvent. In this connection, the resin (A) has a structure wherein a polar group is protected by a leaving group that is decomposed and separated by the action of an acid, and the leaving group is a group represented by general formula (I).