| 发明名称 |
STRUCTURE PROVIDED WITH CARBON FILM AND METHOD FOR FORMING CARBON FILM |
| 摘要 |
A structure according to one embodiment of the present invention has a carbon film, the surface of which is provided with a microrelief structure regardless of the shape of the surface of a base. This structure is provided with a base and a carbon film that is formed on the base and contains carbon, or carbon and hydrogen. At least a part of the surface of this carbon film has a microrelief structure that is formed by means of irradiation of ions and/or radicals (for example, plasma) of oxygen and/or Ar. This microrelief structure has a ten-point average roughness (Rz) of 20 nm or more. |
| 申请公布号 |
WO2015115399(A1) |
申请公布日期 |
2015.08.06 |
| 申请号 |
WO2015JP52130 |
申请日期 |
2015.01.27 |
| 申请人 |
TAIYO CHEMICAL INDUSTRY CO., LTD. |
发明人 |
SHIBUSAWA KUNIHIKO |
| 分类号 |
C01B31/02;C23C16/26;C23C16/56;H01M8/02 |
主分类号 |
C01B31/02 |
| 代理机构 |
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