(METH)ACRYLATE COMPOUND, (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME

摘要

The present invention provides: a good balanced resist which has high sensitivity without deteriorating basic physical properties of a chemically amplified resist such as resolution and line edge roughness (LER); and a compound for resists. The present invention relates to: a (meth)acrylate compound represented by general formula (1); a method for producing the (meth)acrylate compound; a (meth)acrylic copolymer which is obtained by polymerizing a (meth)acrylate compound represented by general formula (1); and a photosensitive resin composition of the (meth)acrylic copolymer. (In general formula (1), R1 represents a hydrogen atom or a methyl group; R2 represents a linear or branched alkyl group having 2-4 carbon atoms; and R3 moieties may be the same as or different from each other, and each represents a group represented by formula (2) or (3), or the like.) (In formulae (2) and (3), the symbols are as defined in the description.)