发明名称 EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
摘要 The present invention provides an exposure apparatus which performs a scanning exposure of each of a plurality of shot regions on a substrate, comprising a measuring device including a first detector configured to perform detection with respect to a measurement point on the substrate and a second detector configured to perform detection with respect to the measurement point prior to detection by the first detector, and configured to measure a height of the substrate based on an output from the first detector and an output from the second detector, and a processor configured to determine, based on measurement obtained based on an output from the first detector along with a scanning exposure of a first shot region, a first measurement point where the measuring device performs measurement first based on an output from the second detector with respect to a second shot region.
申请公布号 US2015220004(A1) 申请公布日期 2015.08.06
申请号 US201514608731 申请日期 2015.01.29
申请人 CANON KABUSHIKI KAISHA 发明人 TAKEUCHI Hajime
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. An exposure apparatus which performs a scanning exposure of each of a plurality of shot regions on a substrate to radiation, the apparatus comprising: a measuring device including a first detector configured to perform detection with respect to a measurement point on the substrate in a region being exposed to radiation along with scanning of the substrate and a second detector configured to perform detection with respect to the measurement point along with scanning of the substrate prior to detection by the first detector, and configured to measure a height of the substrate based on each of an output from the first detector and an output from the second detector; and a processor configured to determine, based on measurement obtained by the measuring device based on an output from the first detector along with a scanning exposure of a first shot region to radiation, a first measurement point where the measuring device performs measurement first based on an output from the second detector with respect to a second shot region of which a scanning exposure is performed after the first shot region.
地址 Tokyo JP