发明名称 |
EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE |
摘要 |
The present invention provides an exposure apparatus which performs a scanning exposure of each of a plurality of shot regions on a substrate, comprising a measuring device including a first detector configured to perform detection with respect to a measurement point on the substrate and a second detector configured to perform detection with respect to the measurement point prior to detection by the first detector, and configured to measure a height of the substrate based on an output from the first detector and an output from the second detector, and a processor configured to determine, based on measurement obtained based on an output from the first detector along with a scanning exposure of a first shot region, a first measurement point where the measuring device performs measurement first based on an output from the second detector with respect to a second shot region. |
申请公布号 |
US2015220004(A1) |
申请公布日期 |
2015.08.06 |
申请号 |
US201514608731 |
申请日期 |
2015.01.29 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TAKEUCHI Hajime |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. An exposure apparatus which performs a scanning exposure of each of a plurality of shot regions on a substrate to radiation, the apparatus comprising:
a measuring device including a first detector configured to perform detection with respect to a measurement point on the substrate in a region being exposed to radiation along with scanning of the substrate and a second detector configured to perform detection with respect to the measurement point along with scanning of the substrate prior to detection by the first detector, and configured to measure a height of the substrate based on each of an output from the first detector and an output from the second detector; and a processor configured to determine, based on measurement obtained by the measuring device based on an output from the first detector along with a scanning exposure of a first shot region to radiation, a first measurement point where the measuring device performs measurement first based on an output from the second detector with respect to a second shot region of which a scanning exposure is performed after the first shot region. |
地址 |
Tokyo JP |