发明名称 |
DISTRIBUTED ON-CHIP DECOUPLING APPARATUS AND METHOD USING PACKAGE INTERCONNECT |
摘要 |
An integrated circuit device is disclosed. The integrated circuit device includes a semiconductor die fabricated by a front-end semiconductor process and having oppositely disposed planar surfaces. The semiconductor die is formed with semiconductor devices, power supply circuitry coupled to the semiconductor devices, decoupling capacitance circuitry, and through-vias. The through-vias include a first group of vias coupled to the power supply circuitry and a second group of vias coupled to the decoupling capacitance circuitry. Conductors are formed in a first metal layer disposed on the semiconductor die in accordance with a back-end semiconductor process. The conductors are configured to couple to the first and second groups of through-vias to establish conductive paths from the power supply circuitry to the decoupling capacitance circuitry. |
申请公布号 |
US2015221589(A1) |
申请公布日期 |
2015.08.06 |
申请号 |
US201514683073 |
申请日期 |
2015.04.09 |
申请人 |
Rambus Inc. |
发明人 |
Secker David;Yang Ling;Tran Chanh;Ji Ying |
分类号 |
H01L23/528;H03K5/1252;H01L23/48 |
主分类号 |
H01L23/528 |
代理机构 |
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代理人 |
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主权项 |
1. An integrated circuit device comprising:
a semiconductor die fabricated by a front-end semiconductor process and having oppositely disposed planar surfaces, the semiconductor die formed with
semiconductor devices,power supply circuitry coupled to the semiconductor devices,decoupling capacitance circuitry, andthrough-vias including a first group of vias coupled to the power supply circuitry and a second group of vias coupled to the decoupling capacitance circuitry; and conductors formed in a first metal layer disposed on the semiconductor die, the first metal layer fabricated by a back-end semiconductor process, the conductors configured to couple to the first and second groups of vias to establish conductive paths from the power supply circuitry to the decoupling capacitance circuitry. |
地址 |
Sunnyvale CA US |