发明名称 SAMPLE PREPARATION FOR SPECTROSCOPY ANALYSIS
摘要 A sample is cleaned up for spectroscopic analysis by receiving a slide substrate having the sample thereon, fixing the sample to a substrate surface of the slide substrate by applying heat to the slide substrate for a predetermined heating time and incubating the sample on the slide substrate for a predetermined incubation time after fixing the sample to the slide substrate. The sample is further cleaned by washing the sample on the slide substrate after the sample has been incubated and drying the sample by applying heat to the slide substrate for a predetermined drying time, wherein the sample on the slide substrate after drying has retained particles of interest and interferant particles are removed from the substrate. A substrate is also provided for sample collection, which is culturable and Raman silent.
申请公布号 US2015219535(A1) 申请公布日期 2015.08.06
申请号 US201514689159 申请日期 2015.04.17
申请人 Battelle Memorial Institute 发明人 Bartko Andrew P.;Gao Johnway
分类号 G01N1/30;G01N1/31 主分类号 G01N1/30
代理机构 代理人
主权项 1. A method to clean a sample for spectroscopic analysis, comprising: receiving a slide substrate having a sample thereon; fixing the sample to a substrate surface of the slide substrate at a sample fixing station, by applying heat to the slide substrate for a predetermined heating time; incubating the sample on the slide substrate at an incubation station, for a predetermined incubation time after fixing the sample to the slide substrate; washing the sample on the slide substrate at a washing station, after the sample has been incubated; utilizing a dispenser that dispenses a solution comprising an organic solvent that is selected to remove interferant particles from the slide substrate while retaining particles of interest that have been collected onto the slide substrate, where the dispenser is common to the washing station and at least one of the fixing station and the incubation station; and drying the sample at a drying station, by applying heat in the range of 65° Celsius (C) to 115° C. for to the slide substrate for a time in the range of 5-60 seconds, wherein the sample on the slide substrate after drying has retained particles of interest and interferant particles are removed from the substrate.
地址 Columbus OH US