| 摘要 |
<p>This charged particle beam device comprises: an electron beam source (1); a charged particle optical system that includes an object lens (9) and that irradiates a sample (10) with electrons emitted from the electron beam source (1) as an electron beam (2); an aberration corrector (6) that corrects aberrations in the charged particle optical system; and a control unit (24) that controls the components of the charged particle optical system and the aberration corrector (6). The charged particle beam device further comprises an automatic aberration-correcting device (17) that autonomously acquires, through leaning, optimum adjustment procedures in order to reduce the time required for correcting parasitic aberrations that arise in the aberration corrector (6).</p> |
