METHOD OF MANUFACTURING MOTHER SUBSTRATE ASSEMBLY

摘要

A method of manufacturing a mother substrate assembly forms a metal layer on the front surface of a transparent substrate and successively forms an etch stop layer and a photoresist layer on the metal layer. After that, the photoresist layer in a substrate region is full-exposed by using a first mask. The photoresist layer in the display region is under-exposed. An exposure step of shielding a non-display region and an align key region is carried out. After that, main and sub photoresist layers with different heights are formed. A develop step of exposing the upper surface of the etch stop layer in the substrate region is carried out. The etch stop layer and the metal layer in the substrate region are removed. An align key is formed in the align key region. A process of etching and removing the sub photoresist layer is carried out. After the etch stop layer in the display region is removed, the main photoresist layer is stripped to expose the non-display region and the align key region. After that, the metal layer in the display region is etched to form a metal nanowire.