发明名称 |
Charged particle radiation apparatus, and method for displaying three-dimensional information in charged particle radiation apparatus |
摘要 |
Disclosed is a charged particle radiation apparatus capable of capturing a change in a sample due to gaseous atmosphere, light irradiation, heating or the like without exposing the sample to atmosphere. The present invention relates to a sample holder provided with a sample stage that is rotatable around a rotation axis perpendicular to an electron beam irradiation direction, the sample holder being capable of forming an airtight chamber around the sample stage. A sample is allowed to chemically react in any atmosphere, and three-dimensional analysis on the reaction is enabled. A sample liable to change in atmosphere can be three-dimensionally analyzed without exposing the sample to the atmosphere. |
申请公布号 |
US9099281(B2) |
申请公布日期 |
2015.08.04 |
申请号 |
US201013503976 |
申请日期 |
2010.10.22 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Yaguchi Toshie;Nagakubo Yasuhira;Azuma Junzo;Watabe Akira |
分类号 |
H04N13/02;H01J37/26;G01N23/22;H01J37/18;H01J37/20;G01N23/225 |
主分类号 |
H04N13/02 |
代理机构 |
Crowell & Moring LLP |
代理人 |
Crowell & Moring LLP |
主权项 |
1. A charged particle radiation apparatus, comprising:
a sample holder including a sample stage to hold a sample; a sample chamber to which the sample holder is inserted; a gun to generate a charged particle beam to be applied to the sample; a detector to detect a radiation from the sample; and a processor to acquire an image from the radiation from the sample, wherein the sample holder includes a rotation mechanism including a rotary shaft being capable of rotating the sample stage around a rotation axis by a predetermined angle, and a shielding mechanism capable of forming an airtight chamber around the sample stage, and the charged particle radiation apparatus further comprising a piping to supply the sample with a medium which reacts to the sample, wherein at least a part of the piping is in the rotary shaft and the shielding mechanism; wherein the processor acquires a first image before supplying the medium, a second image after supplying the medium, three dimensional information from the first image and the second image, and a distance between rare metal catalyst particles. |
地址 |
Tokyo JP |