Method and apparatus for reducing stripe patterns

摘要

A method for reducing stripe patterns comprising receiving scattered light signals from a backside surface of a laser annealed backside illuminated image sensor wafer, generating a backside surface image based upon the scattered light signals, determining a distance between an edge of a sensor array of the laser anneal backside illuminated image sensor wafer and an adjacent boundary of a laser beam and re-calibrating the laser beam if the distance is less than a predetermined value.

主权项

1. A method comprising:
implanting sensors in a wafer; applying a laser beam to anneal the wafer, wherein the laser beam has a boundary size greater than a boundary size of a sensor array formed by a plurality of sensors; applying an incident light to a surface of the wafer; receiving scattered light signals from the incident light; generating a surface image based upon the scattered light signals; determining a distance between an edge of the sensor array of the wafer and an adjacent boundary of a laser beam; and re-calibrating the laser beam if the distance is less than a predetermined value.