PATTERN FORMATION METHOD, ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a pattern capable of achieving excellent PEB temperature dependency and excellent density distribution dependency at high dimension, an active ray-sensitive or radiation-sensitive resin composition used for the pattern formation method, a method for producing an electronic device using the pattern formation method and an electronic device.SOLUTION: There are provided: a method for forming a pattern which comprises: a step of forming a film using (A) a resin whose polarity is increased by the action of an acid and whose solubility into a developer containing organic solvent is reduced, (B) a compound which generates an acid by irradiation with specific active rays or radiation and (C) an active ray-sensitive or radiation-sensitive resin composition containing a solvent; a step of exposing the film; and a step of developing the exposed film by using a developing solution containing an organic solvent, wherein the resin (A) has a structure in which a polar group is protected with a leaving group capable of decomposing and leaving by an action of an acid and the leaving group is a group represented by the general formula (I); and an active ray-sensitive or radiation-sensitive resin composition used for the pattern formation method.