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发明名称
磊晶成长用之内部改质基板及使用此基板制造之结晶成膜体、元件、本体基板及其等之制造方法
摘要
申请公布号
TWI494476
申请公布日期
2015.08.01
申请号
TW098144132
申请日期
2009.12.22
申请人
并木精密宝石股份有限公司;迪斯科股份有限公司
发明人
会田英雄;青田奈津子;星野仁志
分类号
C30B29/20;C30B33/04
主分类号
C30B29/20
代理机构
代理人
洪澄文 台北市南港区三重路19之6号2楼
主权项
一种磊晶成长用之内部改质基板,在被作为由磊晶成长而形成结晶性膜成膜之用的单结晶基板中,于前述单结晶基板内部形成利用脉冲雷射的多光子吸收的改质区域图案;前述改质区域图案的平面形状为条纹形状、格子形状、配置有复数多角形的形状、同心圆形状、螺旋形状、相对通过单结晶基板中心点的直线略呈线对称或略呈点对称形状的其中任一者。
地址
日本
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