METHOD OF EHCHING METAL LAYER

摘要

The present invention relates to a method of etching a metal film, and, more specifically, in a method of etching to perform the etching with an etching solution composition on a metal film, a method of etching a metal film, which can remarkably reduce the etching time of the metal film by comprising a step for modifying a surface condition of the surface to be etched of the metal film with ultraviolet light before etching with an etching solution.