| 摘要 |
<p>A proximity type exposure apparatus is provided to prevent displacement of a chuck for fixing a mask during gap tilting in an exposure process, thereby stably driving an exposure stage. A mask fixing stage(110) is for fixing a mask(103) for exposure. A first tilt unit(120) is formed on the mask fixing stage and has a point restriction pad. A second tilt unit(130) is formed on the mask fixing stage and has a line restriction pad. A third tilt unit(140) is formed on the mask fixing stage and has a surface restriction pad. In a support chuck, a substrate where a mask pattern is transferred is mounted. A location of the support chuck is arranged by the point, line and surface restriction pads.</p> |
