| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for polishing a glass substrate, which solves problems of difficulty in controlling a pressure for non-contact polishing and the generation of concave defects due to entry of contaminants into a polishing liquid.SOLUTION: A method for polishing a glass substrate, in which a polishing surface of a polishing pad 10 and a main surface of a glass substrate 20 are relatively moved while maintaining a state they face each other and a polishing liquid 30 is fed between them. The shape of the main surface of the glass substrate is a square. A pressure on the main surface of the glass substrate, a relative velocity between the center of the main surface of the glass substrate and the opposing polishing pad, a viscosity of the polishing liquid, a wedge value of the glass substrate defined in SEMI P37-1102, a length of one side of the glass substrate, an angle between the wedge direction and the direction of the relative velocity V of the glass substrate, an average clearance between the glass substrate and the polishing pad, which is equivalent to the thickness of the polishing liquid, and a total polished amount P on the main surface of the glass substrate for polishing back to a point of 0.05×P from the end of polishing are controlled to satisfy a specific relationship. |
