COMPOSITION FOR FORMING ALKALI DISSOLUTION-DEVELOPABLE HIGH-REFRACTIVE-INDEX FILM AND PATTERN FORMING METHOD

摘要

[Problem] To provide: a film forming composition which is suitable for the production of a film having high refractive index, high transparency, high heat resistance, high light resistance and high hardness; and a pattern forming method. [Solution] A film forming composition which contains: a silicon compound (A) that is a hydrolysis-condensation product of a hydrolyzable silane containing a hydrolyzable silane (a1) represented by formula (a1) and a hydrolyzable silane (a2) represented by formula (a2) and has a weight average molecular weight of 700-4,000; inorganic particles (B) having an average particle diameter of 1-100 nm and a refractive index of 1.50-2.70; and a solvent (C). The silicon compound (A) is a polymer that is obtained by hydrolyzing and condensing a hydrolyzable silane which contains the hydrolyzable silane (a1) and the hydrolyzable silane (a2) respectively in an amount of 90-50% by mole and in an amount of 10-50% by mole. Si(R1)4 Formula (a1) L-Si(R2)3 Formula (a2) (In the formulae, each of R1 and R2 represents an alkoxy group having 1-20 carbon atoms, an acyloxy group having 2-20 carbon atoms or a halogen group; and L represents a linear, branched or cyclic alkyl group having 3-6 carbon atoms.)