发明名称 |
ATOMIC LAYER DEPOSITION PROCESSING CHAMBER PERMITTING LOW-PRESSURE TOOL REPLACEMENT |
摘要 |
The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) processing chamber for device fabrication and methods for replacing a gas distribution plate and mask of the same. The ALD processing chamber has a slit valve configured to allow removal and replacement of a gas distribution plate and mask. The ALD processing chamber may also have actuators operable to move the gas distribution plate to and from a process position and a substrate support assembly operable to move the mask to and from a process position. |
申请公布号 |
WO2015112467(A1) |
申请公布日期 |
2015.07.30 |
申请号 |
WO2015US11945 |
申请日期 |
2015.01.20 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KURITA, SHINICHI;KUDELA, JOZEF;WHITE, JOHN M.;HAAS, DIETER |
分类号 |
H01L51/56;H01L21/205 |
主分类号 |
H01L51/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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