发明名称 PROCESS LIQUID NOZZLE AND APPLICATION PROCESSING UNIT
摘要 PROBLEM TO BE SOLVED: To provide a process liquid nozzle which removes foreign objects in a process liquid to inhibit clogging therein and thereby properly supplies the process liquid to a substrate.SOLUTION: A process liquid nozzle 132 includes: an upper block 200; a lower block 201; a solvent circulation space 202 formed in an inner space of the upper block 200 and the lower block 201; and a solvent flow passage 244 which connects a solvent discharge port 243 with the circulation space 202. The circulation space 202 includes foreign object collection spaces 231 which are formed below an upper end of the flow passage 244 and used for precipitating and collecting the foreign objects in the solvent.
申请公布号 JP2015138961(A) 申请公布日期 2015.07.30
申请号 JP20140011739 申请日期 2014.01.24
申请人 TOKYO ELECTRON LTD 发明人 NISHIMURA SATOSHI;IMOTO NAOKI
分类号 H01L21/02 主分类号 H01L21/02
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