发明名称 APPARATUS AND METHOD FOR CONTROLLING POSITION OF STAGE
摘要 <p>PROBLEM TO BE SOLVED: To provide an apparatus and a method for controlling a position of a stage which are capable of performing positional control of the stage at high speed and high accuracy even at a location having large atmospheric fluctuation or mechanical vibration.SOLUTION: By using an interference optical system 60 which uses an optical comb having predetermined repetition frequency as a light source, a spatial position of an object 18 to be measured attached to a stage 10 is accurately detected by each position having a spatial interval Dr corresponding to a frequency interval of a predetermined repetition frequency, and a displacement amount (error) from a detection value of a linear encoder which detects a spatial position of the stage 10 is measured. Then, the spatial position of the stage 10 detected by the linear encoder is calibrated based on the displacement amount by each position of the stage 10 that is controlled to be positioned. Thus, Abbe's condition is satisfied, and the space positioning of the stage 10 is realized extremely precisely on nanometer order.</p>
申请公布号 JP2015137969(A) 申请公布日期 2015.07.30
申请号 JP20140010431 申请日期 2014.01.23
申请人 TOKYO SEIMITSU CO LTD 发明人 MATSUMOTO HIROKAZU;ISHII MASAFUMI
分类号 G01B11/00;G01B9/02;G01S17/32 主分类号 G01B11/00
代理机构 代理人
主权项
地址