| 摘要 |
A water treatment apparatus (10, Fig. 1A) comprises an inlet (16, Fig. 1A) configured to be connected to a source of liquid to be treated, and at least one liquid treatment vessel (12, Fig. 1A) arranged to expose liquid in the vessel to ultraviolet radiation in an advanced oxidation process reaction. The apparatus also comprises a source of ultraviolet (UV) radiation (50, 54, Fig. 1B) having a longitudinal axis oriented substantially parallel to a direction of flow of liquid past the source. A boundary surface between the source and a liquid to be treated is provided with one or more cleaning elements 1012 which extend in a longitudinal direction of the boundary surface. The cleaning element(s) and the boundary surface are arranged to be rotationally moveable relative to one another around the longitudinal axis of the source. The boundary surface can be a sheath or thimble 56 which accommodates a UV lamp. Suitably, the cleaning elements comprise wiper elements. The cleaning elements can comprise filaments or bristles. A method of treating water in an advanced oxidation process reaction is also claimed. |
