| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for protection film formation of a touch panel allowing alkali development, having high hardness, and being excellent in heat resistant adhesion and moisture and heat resistant adhesion to a substrate and a transparent conductive film. <P>SOLUTION: An alkali developable photosensitive resin composition contains, as an essential component, a polysiloxane compound (A) having a certain chemical structure; at least one kind of ester compound (B) selected from the group consisting of phthalic acid ester, trimellitic acid ester and pyromellitic acid ester, containing an ethylenically unsaturated bond-containing group (x); a polyfunctional (meth)acrylate monomer (C); and a photo-radical polymerization initiator (D). <P>COPYRIGHT: (C)2013,JPO&INPIT |
